Sputtering observed to occur below the threshold energy of physical sputtering is also often called chemical sputtering. [2][5] The mechanisms behind such sputtering are not always well understood, …

2025年8月8日 · Sputtering, also known as sputter deposition, is a coating technique of PVD processes based on high vacuum conditions. Moreover, it is used as a cleaning method to produce high-purity …

There are different kinds of sputtering processes, depending on condition (reactive sputtering, bias sputtering) or configuration (ion beam sputtering, DC sputtering, RF sputtering, magnetron sputtering).

スパッタリングとは、真空中で不活性ガスを導入、ターゲットにマイナスの電圧を印加してグロー放電を発生させ、ターゲットを構成する成膜材料の粒子を激しく弾き出し、勢いよく基材・基板の表面 …

薄膜の成膜技術で、現在もっともよく使われる方法のひとつがスパッタリングです。 言葉は聞いたことがあっても、その原理や特徴、成膜の作り方まではよくわからない人も多いでしょう。

2025年1月27日 · Sputtering is a process that enables the creation of film coating made of sputtered atoms. Without this method, it would be nearly impossible to attain the high-quality coating films …

In this article, after defining what sputtering is, we aim to help you understand the sputtering process, different types of sputtering methods with their advantages and limitations, and applications of …

スパッタリング とは、真空中に不活性ガス（主にArガス）を導入しながら基板とターゲット（成膜させる物質Cr・Ti等）間に直流高電圧を印加し、イオン化したArをターゲットに衝突させて、はじき飛 …

2025年5月23日 · Sputtering is a Physical Vapor Deposition (PVD) process that physically dislodges atoms from a solid target material using ion bombardment. These atoms then travel through a …

2025年8月8日 · Sputtering is a foundational process in semiconductor manufacturing, serving as a key method for thin-film deposition. In this technique, a target material undergoes bombardment by high …