This article describes the properties and applications of Graphenea's range of CVD graphene films on silicon and silicon dioxide substrates. Monolayer graphene is produced using the CVD process on a ...
An extensive range of insulating thin films are utilized in modern VLSI circuits providing electrical isolation between conducting regions within a device and as a final capping passivation layer.
Top image: Schematics illustrating spin transport in CVD graphene on Si/SiO2 substrate, with ferromagnetic contacts (Co/TiO2) for spin injection and detection. Bottom image: An optical microscope ...
Abstract: Large-aperture (larger than $100\times 100\mu \mathrm{m}^{2}$) membrane structure is one of the essential structures for MEMS and optical devices. We have fabricated 400nm-thick, 400-to-$700 ...
Abstract: A newly developed temporary bonding method for die population on a carrier wafer with CVD dielectric film has been demonstrated. With this integration approach, the temporary bonding is done ...
Owing to their remarkable electronic properties, silica ultrathin films have been utilized as an insulating layer in nanoelectronics systems. Silica films have been epitaxially grown on different ...
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