Abstract: This paper presents measurement of nonlinear viscoelasticity of a polishing pad and identification of nonlinear viscoelasticity parameters. Since the polishing pad consists of high polymer ...
Abstract: A new polishing pad based on the sol-gel (SG) technique is fabricated and can polish the single crystal diamond (SCD) substrate at high speed. In this work, the base material, fillers, and ...
PHILADELPHIA--(BUSINESS WIRE)--Dow Electronic Materials, a business unit of The Dow Chemical Company (NYSE:DOW), today introduced its new IKONIC™ polishing pad platform, bringing to market Dow’s most ...
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