ニューフレアテクノロジー (NFT)は、2026年2月22日から26日まで米国カリフォルニア州サンノゼ市で開催された「SPIE Advanced Lithography + Patterning」に参加しました。 本学会は、 光学やフォトニクスの分野における国際学会であるSPIE (The International Society for Optical Engineering, ...

In single-cell analysis, cellular activity and parameters are assayed on an individual, rather than population-average basis. Essential to observing the activity of these cells over time is the ...

【NIKKEI COMPASS】２０２６年３月４日株式会社ニューフレアテクノロジーニューフレアテクノロジー（ＮＦＴ）は、２０２６年２月２２日から２６日まで米国カリフォルニア州サンノゼ市で開催された「ＳＰＩＥ　Ａｄｖａｎｃｅｄ　Ｌｉｔｈｏｇｒａｐｈｙ　＋　Ｐａｔｔｅｒｎｉｎｇ」に参加しました。本学会は、　光学やフォトニクスの分野にお ...

Chip scaling is becoming more difficult at each process node, but the industry continues to find new and innovative ways to solve the problems at every turn. And so chipmakers continue to march down ...

What’s in store for chipmakers at 7nm, 5nm and beyond, and why atomic-level etch and deposition are getting new attention. Prabu Raja, group vice president and general manager for the Patterning and ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

Figure 1. A systematic diagram from material dimensions and patterning processes to device applications. Perovskite structure. Major patterning methods, including template-confined growth, inkjet ...

SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...

August 26, 2014. Today, KLA-Tencor Corp. introduced the WaferSight PWG patterned wafer geometry measurement system, the LMS IPRO6 reticle pattern placement metrology system and the K-T Analyzer 9.0 ...

In a new article in Nature Communications, a research group led by Grigory Genikhovich at the University of Vienna has found that the way the main body axis of sea anemones is patterned by different ...