In single-cell analysis, cellular activity and parameters are assayed on an individual, rather than population-average basis. Essential to observing the activity of these cells over time is the ...

To help overcome patterning challenges for leading-edge chips, Applied Materials offers a portfolio of technologies designed to complement the latest advances in lithography. The company’s newest ...

Chip scaling is becoming more difficult at each process node, but the industry continues to find new and innovative ways to solve the problems at every turn. And so chipmakers continue to march down ...

What’s in store for chipmakers at 7nm, 5nm and beyond, and why atomic-level etch and deposition are getting new attention. Prabu Raja, group vice president and general manager for the Patterning and ...

Unoh Kwon, vice president at high performance memory maker SK hynix, talks on stage at the opening plenary session at the ...

Figure 1. A systematic diagram from material dimensions and patterning processes to device applications. Perovskite structure. Major patterning methods, including template-confined growth, inkjet ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...

August 26, 2014. Today, KLA-Tencor Corp. introduced the WaferSight PWG patterned wafer geometry measurement system, the LMS IPRO6 reticle pattern placement metrology system and the K-T Analyzer 9.0 ...