株式会社日立ハイテク(以下、日立ハイテク)は、このたび高精度電子線計測システム「GT2000」(以下、本製品)を発売します。本製品は、日立ハイテクがトップシェアをもつCD-SEM*1の技術やノウハウを適用しながら、High-NA EUV露光向けに低ダメージ高精度計測 ...

Imec, the research and innovation hub, has patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands.

TSMC reiterated its long-known stance on next-generation High-NA EUV lithography tools at its European Technology Symposium in Amsterdam. The company does not require these highest-end lithography ...

SK Hynix has become the first memory manufacturer to install ASML’s next-generation High-NA Extreme Ultraviolet (EUV) lithography system. The installation of the Twinscan EXE:5200B at its M16 fab in ...

Samsung is investing 1.1 trillion won (USD 773 million) in the two high-NA EUV machines Samsung Electronics is expected to receive its first high-numerical-aperture (high-NA) extreme ultraviolet (EUV) ...