Impact Statement: We demonstrate a YDH/SiO2 DBR with a reflectivity higher than 99.9% operating in the UV-C wavelength regime. With only 15 periods, the DBR exhibits a 50 nm wide stopband centered at ...
Abstract: In this study, we investigate the deposition of high-k dielectric materials, namely Al2O3 and HfO2, using atomic layer deposition for 4H-SiC metal-oxide-semiconductor applications. C-V ...
The structural properties of the glass matrix 40SiO(2)·30Na(2)O·1Al(2)O(3)·(29-x)B(2)O(3)·xFe(2)O(3) (mol%), 0.0≤x≤29.0 were studied by X-ray diffraction (XRD), differential thermal analysis (DTA) and ...
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